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Papers of Title

Ultra Clean Processing of Semiconductor Surfaces IX

Table of Contents (87 papers, 10 per page listed)


Direct Observation of Single Bubble Cavitation Damage for MHz Cleaning   download PDF
Hiroshi Tomita, Minako Inukai, Kaori Umezawa, Li Nan Ji
p3
High Speed Imaging of 1 MHz Driven Microbubbles in Contact with a Rigid Wall   download PDF
Aaldert Zijlstra, Tom Janssens, Kurt Wostyn, Michel Versluis, Paul W. Mertens, Detlef Lohse
p7
Characterization of a Cavitation Bubble Structure at 230 kHz: Bubble Population, Sonoluminescence and Cleaning Potential   download PDF
Andrea Otto, Till Nowak, Robert Mettin, Frank Holsteyns, Alexander Lippert
p11
Impact of Megasonic Activation with Different Chemistries on Silicon Surface in Single Wafer Tool   download PDF
Guillaume Briend, Pascal Besson, Thierry Salvetat, Sébastien Petitdidier
p15
Impacts of Ionization Potentials and Megasonic Dispersion   download PDF
Cole Franklin
p19
The Influence of Standing Waves on Cleaning with a Megasonic Nozzle   download PDF
Tom Janssens, G. Doumen, S. Halder, Kurt Wostyn, Paul W. Mertens, Joachim Straka
p23
Megasonic Sweeping and Silicon Wafer Cleaning   download PDF
J.M. Goodson, R. Nagarajan
p27
Removal of Nano-Particles by Aerosol Spray: Effect of Droplet Size and Velocity on Cleaning Performance   download PDF
K. Xu, S. Pichler, Kurt Wostyn, G. Cado, C. Springer, Glenn W. Gale, Michael Dalmer, Paul W. Mertens, Twan Bearda, E. Gaulhofer, D. Podlesnik
p31
High Aspect Ratio Contact Clean Study in 58nm Flash Device   download PDF
Pi Chun Yu, Cheng Kuen Chen, Jin Lang Lin, Chih Ning Wu, Hiroshi Matsuo
p35
High Velocity Aerosol Cleaning with Organic Solvents: Particle Removal and Substrate Damage   download PDF
Michael T. Andreas, Kurt Wostyn, Masayuki Wada, Tom Janssens, Karine Kenis, Twan Bearda, Paul W. Mertens
p39