Ultra Clean Processing of Semiconductor Surfaces IX

Ultra Clean Processing of Semiconductor Surfaces IX
ISBN-13:

978-3-908451-64-8

Subtitle:

UCPSS 2008

Authors / Editors:

Paul Mertens, Marc Meuris and Marc Heyns

Category:

Selected, peer reviewed papers from the 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), held in Bruges, Belgium, September 22-24, 2008

Pages:

412

Year:

2009

Periodical:

Solid State Phenomena Vols. 145-146

Edition:

softcover

TOC:
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All papers are available online at www.scientific.net
Description:

Volume is indexed by Thomson Reuters CPCI-S (WoS).
The contents of this publication include every conceivable issue related to contamination, cleaning and surface preparation during mainstream large-scale integrated circuit manufacture. Typically, silicon is used as the main semiconductor substrate. However, other semiconducting materials such as SiGe and SiC are currently being used in the source-sink junction areas, and materials such as Ge and III-V compounds are being considered for the transistor channel region of future-generation devices. read more...

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