Metrology and Removal of Nanoparticles from 500 Micron Deep Trenches
O. Guldiken, K. Bakhtari, Ahmed A. Busnaina, J. Park |
p137 |
|
Evaluation of Megasonic Cleaning for Sub-90nm Technologies
Guy Vereecke, Frank Holsteyns, Sophia Arnauts, S. Beckx, P. Jaenen, Karine Kenis, M. Lismont, Marcel Lux, Rita Vos, James Snow, Paul W. Mertens |
p141 |
|
Strength Distribution of Megasonic Damage Events
Kurt K. Christenson |
p147 |
|
Using Megasonics for Particle and Residue Removal in Single Wafer Cleaning
Steven Verhaverbeke, Roman Gouk, Dennis Yost |
p151 |
|
Behaviour of a Well-Designed Megasonic Cleaning System
Alexander Lippert, P. Engesser, Garry Ferrell, J. Klitzke, Martin Köffler, Franz Kumnig, Jörg Leberzammer, Alexander Pfeuffer, Rainer Obweger, Harald Okorn-Schmidt, Harry Sax |
p155 |
|
Megasonics: A Cavitation Driven Process
Frank Holsteyns, Kun Tack Lee, Sabine Graf, Roger Palmans, Guy Vereecke, Paul W. Mertens |
p159 |
|
Electrophoretic Studies on Silicon Nitride: Traces of Silicates in UPW Shift Zeta Potential Similar to SC-1
Alexander Pfeuffer, Wolfgang Bensch, Alfred Lechner, Harald Okorn-Schmidt |
p163 |
|
Damage-Free Cleaning of Sub-50 nm Devices Using Directed Megasonics Technology in a Single Wafer Processor
J.J. Rosato, M.R. Yalamanchili, M.J. Beck, R.Y. Lillard |
p167 |
|
A Comparison of Particle Filtration in a Recirculated Wet Bench Wet Cleaning Tool: Performance of PTFE Filters and of Surface Optimized Filters
Günter Haas, Bipin Parekh, Jeremie Frankhauser, Benoît Viallet, Patrick Palka, Jérôme Bras |
p171 |
|
Influences of Oxide Loss on Contamination Removal
Atsuro Eitoku, James Snow, Rita Vos, Karine Kenis, Paul W. Mertens |
p177 |
