Selective Wet Etching of High-k Gate Dielectrics
Kurt K. Christenson, Brent Schwab, Thomas J. Wagener, Bruce Rosengren, Deborah J. Riley, Joel Barnett
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p129 |
Investigation of Particle Removal from Silicon Surfaces by Means of Dry and Steam Laser Cleaning
P. Leiderer, M. Mosbacher, J. Boneberg, C. Bartels, F. Lang, Conrado R.M. Afonso, D. Baeuerle
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p133 |
A Comprehensive Model for Cleaning Semiconductor Wafers
Gretchen Burdick, Sean Eichenlaub, Neil Berman, Stephen Beaudoin
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p135 |
Effect of Transient pH on Particle Deposition during Immersion Rinsing
Wim Fyen, Kai Dong Xu, Rita Vos, Guy Vereecke, Paul W. Mertens, Marc M. Heyns
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p139 |
Influence of Hardware and Chemistry on the Removal of Nano-Particles in a Megasonic Cleaning Tank
Guy Vereecke, Marc M. Heyns, Rita Vos, Frank Holsteyns, M. Schmidt, M. Baeyens, S. Gomme, James Snow, Paul W. Mertens, V. Coenen, T. Bauer
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p143 |
Influence of Frequency on the Removal Efficiency of Nano-Particles in a Megasonic Spray Cleaning Tool
M. Schmidt, Guy Vereecke, Rita Vos, Frank Holsteyns, M. Baeyens, Paul W. Mertens
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p147 |
A Theoretical and Experimental Study of Damage-Free BEOL Cleaning with Megasonic Agitation
Jeffrey M. Lauerhaas, Yi Wu, Mario Bran, Brian Fraser, Eric Brause, Tom Nicolosi
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p151 |
Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool
Atsuro Eitoku, James Snow, Rita Vos, M. Sato, S. Hirae, Kazuo Nakajima, M. Nonomura, M. Imai, Paul W. Mertens, Marc M. Heyns
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p157 |
Relation between Particle Density and Haze on a Wafer: a New Approach to Measuring Nano-Sized Particles
Kai Dong Xu, Rita Vos, Guy Vereecke, Marcel Lux, Wim Fyen, Frank Holsteyns, Karine Kenis, Marc M. Heyns, Paul W. Mertens, Chris Vinckier
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p161 |
TXRF Analysis of Low Z Elements and TXRF-NEXAFS Speciation of Organic Contaminants on Silicon Wafer Surfaces Excited by Monochromatized Undulator Radiation
Burkhard Beckhoff, R. Fliegauf, Gerhard Ulm, J. Weser, G. Pepponi, C. Streli, P. Wobrauschek, T. Ehmann, L. Fabry, S. Pahlke, B. Kanngießer, W. Malzer
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p165 |