Processing-Induced Defects in Epitaxially Grown p- and n-Type SiGe
M. Mamor, F. Danie Auret, S.A. Goodman
|
p161 |
Quantitative Measurements of Vacancy Defects in High-Energy Ion-Implanted Si
R. Kalyanaraman, T.E. Haynes, V.C. Venezia, D.C. Jacobson, H.J.L. Gossmann, C.S. Rafferty
|
p177 |
Positron Annihilation Studies of Vacancy Defects in Crystalline and Amorphous Si
G. Amarendra
|
p189 |
Modelling Cu Diffusion into a Ta Barrier
Chun Li Liu
|
p219 |
Transmission Electron Microscopy of the Configuration of Cracks and the Defect Structure near to Cracks in Si
Hiroyasu Saka, Suprijadi
|
p225 |
Study of the Localized Modes in ZnSe:P for the Elucidation of Site Symmetry
N. Sankar, K. Ramachandran
|
p247 |
EBIC/XPS Study of Antimony Equilibrium Segregation at the Germanium Surface
N. Tabet
|
p259 |