Table of contents

Periodical:

Solid State Phenomena

Volume:

Ultra Clean Processing of Silicon Surfaces IV

Papers published in this volume:
Preface and Committees
The Rinsing Problem: Effect of Solute-Surface Interactions on Wafer Purity
Lee M. Loewenstein, Paul W. Mertens
p.1
Hydrogenated Ultrapure Water Production System for Future Wet Cleaning Process
Hiroshi Morita, Jun ichi Ida, T. Mizuniwa, Tadahiro Ohmi
p.7
Behaviour of Metallic Contaminants during Mos Processing
Twan Bearda, Stefan De Gendt, Lee M. Loewenstein, M. Knotter, Paul W. Mertens, Marc M. Heyns
p.11
Hydrogen Peroxide Decomposition in Ammonia Solutions
D. Martin Knotter, Stefan De Gendt, M. Baeyens, Paul W. Mertens, Marc M. Heyns
p.15
New Aspects of the Diluted Dynamic Clean Process
F. Tardif, T. Lardin, A. Maciejny, Adrien Danel, Pieter Boelen, C. Cowache, Ismail Kashkoush, R. Novak
p.19
Single Step Alkaline Cleaning Solution for Advanced Semiconductor Cleaning
M. Baeyens, W. Hub, Bernd O. Kolbesen, A.R. Martin, Paul W. Mertens
p.23
Particle Removal Efficiency and Silicon Roughness in HF-DIW/O3/Megasonics Cleaning
Mauro Alessandri, Enrico Bellandi, Francesco Pipia, F. Cazzaniga, K. Wolke, M. Schenkl
p.27
Industrial Trends in Wet Processing Technology
L.F.Tz. Kwakman, M. Geomini, Didier Lévy, D. Malgouyres
p.31
Particle Addition Behaviour of Oxide Stripping by HF Solutions
Enrico Bellandi, Mauro Alessandri, Francesco Pipia, A. Tonti
p.35