Ultra Clean Processing of Semiconductor Surfaces XII

Ultra Clean Processing of Semiconductor Surfaces XII
ISBN-13:

978-3-03835-242-6

Authors / Editors:

Paul Mertens, Marc Meuris and Marc Heyns

Category:

Selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium

Pages:

350

Year:

2014

Periodical:

Solid State Phenomena Vol. 219

Edition:

Softcover

TOC:
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All papers are available online at www.scientific.net
Description:

Collection of selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium.
The 71 papers are grouped as follows:
Chapter 1: Cleaning for FEOL Applications,
Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area,
Chapter 3: Wet Etching for FEOL Applications,
Chapter 4: Wet Processing of High Aspect Ratio Structures,
Chapter 5: Fluid Dynamics, Cleaning Mechanics,
Chapter 6: Photo Resist Performance and Rework,
Chapter 7: Cleaning for BEOL Interconnect Applications,
Chapter 8: Cleaning for 3D Applications,
Chapter 9: Contamination Control and AMC,
Chapter 10: Cleaning and Wet Etching for Semiconductor Photo-Voltaic Cells read more...

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