Ultra Clean Processing of Semiconductor Surfaces XI

Ultra Clean Processing of Semiconductor Surfaces XI
ISBN-13:

978-3-03785-527-0

Authors / Editors:

Paul Mertens, Marc Meuris and Marc Heyns

Category:

Selected, peer reviewed papers from the 11th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 17-19, 2012, Gent, Belgium

Pages:

350

Year:

2013

Periodical:

Solid State Phenomena Vol. 195

Edition:

softcover

TOC:
Share:  
All papers are available online at www.scientific.net
Description:

Volume is indexed by Thomson Reuters CPCI-S (WoS).
This volume covers various aspects of ultra-clean technology for the large-scale integration of semiconductors. These include cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing, as well as cleaning for semiconductor photo-voltaic applications. Also covered are studies of general topics such as particle removal using acoustic enhancement, the removal of metallic contamination, pattern collapse of fine flexible and fragile features, wetting and drying, contamination control and contamination metrology. The FEOL and BEOL contributions also treat the surface chemistry of silicon and other semiconductors, cleaning related to new gate stacks, cleaning at the interconnect level, resist strip and polymer removal, cleaning and contamination control for various new materials and cleaning following CMP (chemical mechanical polishing). read more...

Buy this volume

Versions ISBN Quantity Price
Print 978-3-03785-527-0
$210.00
CD 978-3-03795-333-4
$210.00
CD+Print * 978-3-03785-527-0
$294.00
eBook ** 978-3-03813-908-9
$185.00
eBook+Print * 978-3-03785-527-0
$276.50

* If you buy CD+Print or eBook+Print, you save 30%
** See an example