Ultra Clean Processing of Semiconductor Surfaces X

Ultra Clean Processing of Semiconductor Surfaces X
ISBN-13:

978-3-03785-388-7

Authors / Editors:

Paul Mertens, Marc Meuris and Marc Heyns

Category:

Selected, peer reviewed papers from the 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 20-22, 2010, Ostend, Belgium

Pages:

356

Year:

2012

Periodical:

Solid State Phenomena Vol. 187

Edition:

softcover

TOC:
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All papers are available online at www.scientific.net
Description:

The International Symposium on Ultra-Clean Processing of Semiconductor Surfaces (UCPSS) is a bi-annual conference which has been organized by IMEC since 1992.
Volume is indexed by Thomson Reuters CPCI-S (WoS).
The scope of the symposium includes all issues related to contamination, cleaning and surface preparation in mainstream large-scale Integrated Circuit manufacture. At first, silicon was typically the main semiconductor of interest. As other semiconducting materials such as SiGe, SiC, Ge and III-V compounds came under consideration for future devices, the scope was broadened so as to include these materials. Parallelling the fast-moving CMOS industry, the photovoltaic industry has also recognized the need to make improvements in cleaning. Moreover, in order to promote these semiconductor cleaning activities in PV, it was decided to add a special session focused on this topic. read more...

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