Electrophoretic Deposition: Fundamentals and Applications IV

Electrophoretic Deposition: Fundamentals and Applications IV
ISBN-13:

978-3-03785-379-5

Authors / Editors:

A. R. Boccaccini, O. Van der Biest, R. Clasen and J.H. Dickerson

Category:

Selected, peer reviewed papers from the 4th International Conference on Electrophoretic Deposition: Fundamentals and Applications, October 2-7, 2011, Puerto Vallarta, Mexico

Pages:

260

Year:

2012

Periodical:

Key Engineering Materials Vol. 507

Edition:

softcover

TOC:
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All papers are available online at www.scientific.net
Description:

Volume is indexed by Thomson Reuters CPCI-S (WoS).
The contributions to this special collection cover a wide range of subject areas related to EPD and reflect the impressive versatility of that technique for materials processing. The topics discussed range from theoretical studies of the fundamental mechanisms of EPD, to novel techniques which exploit EPD for the efficient and cost-effective fabrication of a variety of advanced materials. read more...

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