Characterization of BaTi0.91(Hf0.5,Zr0.5)0.09O3 Films Fabricated by Laser Ablation Technique
Hirofumi Kakemoto, S. Fujita, Y. Masuda |
p89 |
|
Electrical Properties of SrBi2Ta2O9 (SBT) Thin Film Prepared by Metalorganic Chemical Vapor Deposition
N. Nukaga, Hiroshi Funakubo, Kunio Ishikawa, E. Shigeno, Yutaka Sawada |
p93 |
|
Microstructure of Zinc Oxide Grown by rf Magnetron Sputtering: Aspect of Oxygen Vacancy
Tsuyoshi Ogino, Mamabu Komatsu, Isao Sakaguchi, Shunichi Hishita, Naoki Ohashi, Tadashi Takenaka, Kensuke Oki, Noriyuki Kuwano, Hajime Haneda |
p101 |
|
Transparent Conductive Oxide for Solar Cells Having Resistance to High Density Hydrogen Plasma and/or High Temperature
Toshio Kamiya, Takashi Komaru, Satoshi Shimizu, Mika Kanbe, Charles M. Fortmann, Isamu Shimizu |
p105 |
|
Preparation of Al- and Li-Doped ZnO Thin Films by Sol-Gel Method
Shinobu Fujihara, Chikako Sasaki, Toshio Kimura |
p109 |
|
Preparation of CuO Thin Films and Their Electrical Conductivity
Yutake Ohya, Syouko Ito, Takayuki Ban, Yasutaka Takahashi |
p113 |
|
High-TCR Bolometer Thin Films by Sol-Gel Processing
Toru Mori, Katsuya Kawano, Naoki Oda |
p117 |
|
Thickness and Roughness Analysis on YSZ/Si(001) Epitaxial Films with Ultra Thin SiO2 Interface by X-Ray Reflectivity
Chun Hua Chen, N. Wakiya, Atsushi Saiki, Kazuo Shinozaki, Nobuyasu Mizutani |
p121 |
|
Growth and Transport Property of Polycrystalline Silicon Fabricated with Intentional Orientation Control on Glass
Toshio Kamiya, Kouichi Nakahata, Toshiyuki Sameshima, Kazuyoshi Ro, Atsushi Suemasu, Charles M. Fortmann, Isamu Shimizu |
p125 |
|
Thin Film Metallization for Aluminum Nitride
Yoshihiko Imanaka, Anant K. Agarwal, Kishio Yokouchi |
p129 |
