Diagnostics in Reactive Plasmas with Optical Emission Spectroscopy, Probe Measurement and Energy-Mass Spectrometry
P. Awakowicz |
p3 |
|
Crystallography and Microstructure of Thin Films Studied by X-Ray and Electron Diffraction
Robert A. Schwarzer |
p23 |
|
Surface and Thin Film Analysis with Electron and Mass Spectrometric Techniques
A. Wucher |
p61 |
|
The Manufacture of Thin Film Transistors and Color Filters for Flat Liquid Crystal Displays
E. Lueder |
p87 |
|
Doping Diamonds and Diamond Films for Electronic Applications
R. Kalish |
p97 |
|
Recent Results on Reactive Magnetron Sputtering for High-Rate Deposition of Ceramic Compound Films
A. Billard, C. Frantz |
p107 |
|
Fabrication of Micro- and Nanostructures
R. Kassing |
p119 |
|
Modelling of PVC Processes
J. Machet, C. Gautier-Picard, P. Cledat, O. Piot |
p131 |
|
Real Time Optical Method of Stress Measurements in Thin Films
G. Moulard, G. Contoux, G. Motyl, M. Courbon |
p141 |
|
Spectroellipsometric Method for Process Monitoring of Semiconductor Thin Films and Interfaces
R. Brenot, Morten Kildemo, B. Drévillon |
p151 |
