Optimized Amorphous Silicon Based Two-Terminal Thin Film Detectors for Color Recognition
J. Zimmer, D. Knipp, H. Stiebig, H. Wagner |
p221 |
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Material-Selective Planarization of Oxide Layers: A Novel Technology
Th. Detzel, P. Hanesch |
p227 |
|
Depth Profiling of Thin TiSix-Films on Silicon Carbide by SNMS
R. Getto, J. Freytag, M. Kopnarski, H. Oechsner |
p231 |
|
Flowfill-Process as a New Concept for Inter-Metal-Dielectrics
U. Höckele, W. Kröninger, G. Pfeiffer, M.M. Frank, J. Marktanner, K. Beekmann |
p235 |
|
Copper Metallization of Submicron Trenches with Pulsed Vacuum Arc
P. Siemroth, P. Wenzel, Th. Witke, Bernd Schultrich |
p239 |
|
High Resolution TEM Investigations of Nanostructures in Hard Amorphous Carbon Films
H. Banzhof, K. Brand, H. Lichte, A. Luft, F.-C. Meyer, H.-J. Scheibe, Bernd Schultrich, H. Ziegele |
p243 |
|
Properties of Si3N4-Layers Deposited by Medium Frequency Twin Magnetron Sputtering
M. Ruske, G. Bräuer, J. Pistner, J. Szczyrbowski, A. Zmelty |
p247 |
|
On the Initial Cubic Phase Nucleation in Boron Nitride Films
J. Ye, H. Oechsner |
p251 |
|
Structure, Composition and Residual Stresses of Magnesium Fluoride Thin Films Deposited by Direct Evaporation
L. Dumas, J.-Y. Robic, Yves Pauleau |
p255 |
|
Gradient Interface Layers to Improve c-BN Thin Film Adhesion
Renate Freudenberger, S. Reinke, Wilhelm Kulisch, Rodica Fischer, J. Zweck, A. Bergmaier, G. Dollinger |
p259 |
