MOCVD of CdTe on Foreign Substrates
S. Bernardi |
p115 |
|
Open Tube Iso-VPE of Hg1-xCdxTe on CdTe/Sapphire Hybrid Substrates
F. Campanella, S. Bernardi |
p123 |
|
The Influence of an Ultrathin Pseudomorphic Interface Control Layer of Si on the Growth of SrF2 on GaAs
S. Heun, M. Sugiyama, S. Maeyama, Yu Watanabe, Keiji Wada, M. Oshima |
p129 |
|
Deposition of Doped and Undoped ZnO Thin Films fo Gas Sensors
M. Penza, C. Martucci, V.I. Anisimkin, L. Vasanelli |
p137 |
|
Influence of the Deposition Parameters on the Physical Properties of Tin Oxide Thin Films
M. Di Giulio, A. Serra, A. Tepore, R. Rella, P. Siciliano, L. Mirenghi |
p143 |
|
Growth of Thin Chalcopyrite CuInSe2 Films by the Close Spaced Vapour Transport Process
M.L. Addonizio, S. Loreti, A. Agati, M. Pellegrino, L. Quercia, M.K. Jayaraj, A. Parretta |
p149 |
|
Deposition and Characterization of Nitroso-Compound LB Films
R. Rella, P. Siciliano, A. Tepore, L. Valli, G. Vasapollo |
p155 |
|
Dual Ion Beam Deposition and Characterizatio of TiOx Thin Films
A. Rizzo, S. Cucurachi, L. Mirenghi, Silvia Scaglione, L. Vasanelli, E. Melissano |
p161 |
|
Growth of Si:H Thin Films by Hot Filament CVD: μ-Crystalline to Amorphous Transition
R. Polini, V. Barbarossa, C. Minarini, A. Eray, A. Marucci, G. Mattei |
p167 |
|
Triple Ion Beam Sputtering Deposition of β-FeSi2
A. Valentini, E. Chimenti, A. Cola, G. Leo, F. Quaranta, L. Vasanelli |
p173 |
