Bonding Configuration and Defects in Glow-Discharge Amorphous SiNx:H Films Deposited at 300°C and 500°C
Shin Hasegawa, Y. Amano, L. He, T. Inokuma, Y. Kurata |
p335 |
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Doped Glasses for ULSI-Technology: Integration of Molecular Engineering and Plasma-CVD
H. Treichel, J. v. Tomkewitsch, O. Spindler |
p359 |
|
Growth Processes and Defect Densities in Hydrogenated Amorphous Silicon Alloys
J. Robertson |
p381 |
|
Sputter Deposition of Thin Films for High Mobility Poly-Si TFT Fabrication
T. Serikawa |
p387 |
|
Ion Assisted Thin Film Growth in Dual Microwave/Radio Frequency Plasmas
L. Martinu, Michael R. Wertheimer |
p405 |
|
High Powered Pulsed Plasma Enhanced Deposition of Thin Film Semiconductor and Optical Materials
I.P. Llewellyn, K.J.A. Sheach, R.A. Heinecke |
p421 |
|
Plasma-Enhanced Chemical Vapour Deposition of Coatings in the System Ti-B-N
J. Laimer, H. Karner, H. Störi, P. Rödhammer |
p439 |
|
Plasma-Enhanced Metalorganic Chemical Vapor Deposition for High Temperature Superconducting Thin Film
Kenji Ebihara, Tomoaki Ikegami |
p457 |
|
Low Pressure and Low Temperature Synthesis of Diamond Films Using Magneto-Microwave Plasma CVD
J. Wei, H. Kawarada, Akio Hiraki |
p465 |
|
Thermal Plasma Chemical Vapor Deposition
J.V.R. Heberlein, E. Pfender |
p477 |
