Point Defects and Diffusion in Silicon and Gallium Arsenide
U.M. Gösele, T.Y. Tan |
p1 |
|
Diffusion and Low Temperature Deformation by Diffusional Creep of Nanocrystalline Materials
Rainer Birringer, H.Thomas Hahn, H.J. Höfler, J. Karch, H. Gleiter |
p17 |
|
Dopant and Ion Beam Enhanced Grain Growth in Polycrystalline Silicon Films
C.V. Thompson |
p33 |
|
Interface Segregation and Cohesion
C.L. White |
p47 |
|
Oxidation of High Technology Materials
Jean Philibert |
p63 |
|
Interstitial-Substitutional Diffusion in Group III-V and Group IV Semiconductors: The Role of Dislocations
Nicolaas Stolwijk, M. Perret, Helmut Mehrer |
p79 |
|
Diffusion Barriers - For Thin Film Metallizations
S.P. Murarka |
p99 |
|
Contact Metallization for GaAs - A Report on the Development of a Non-Alloyed Ohmic Contact Scheme
L.C. Wang, F. Fang, E.D. Marshall, S.S. Lau |
p111 |
|
High Density Interconnect for Advanced VLSI Packaging
A.C. Adams, R.S. Bentson, W.J. Bertram, H.J. Levinstein, W.Q. McKnight, Jacques J. Rubin, B.A. ter Haar |
p129 |
|
Diffusion in Metallic Thin Films
D. Gupta |
p137 |
