Water Molecule Sensitive Layers Deposited from Hexamethyldisiloxane/Oxygen Mixture at Low Temperature
N. Guermat, A. Bellel, Salah Sahli, Y. Segui, Patrice Raynaud |
p69 |
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Synthesis and Characterization of New Chelating Resin Functionalized with Pyrocatechol Violet and its Application as Extractant for Zinc (II)
T. Belaid, S. Aitali, M. Benamor, K. Belhamel |
p75 |
|
Effects of Hydrogen Partial Pressure on Boron-Doped Hydrogenated Amorphous Silicon (a-Si:H(B)) Properties
N. Khelifati, R. Cherfi, A. Keffous, A. Rahal, M. Kechouane |
p81 |
|
Structural Properties of Al-Cu Thin Films after Heat Treatment
S. Lallouche, M.Y. Debili |
p87 |
|
Comparative Study between Two Polymers of Arylene-Vinylene Units: Electrochemical, Spectroscopic Characterization and Resistivity Measurements
S. Mosbah, I. Zbiri, L. Bencharif |
p95 |
|
Space Resolved Optical Emission Spectroscopy During Deposition of BaxSr1-xTiO3 Thin Films by Double Hollow Cathode Plasma Jet System
J. Olejníček, Zdenek Hubička, M. Čada, P. Virostko, Štepan Kment, P. Adámek, Lubomir Jastrabík, A. Dejneka |
p105 |
|
Photoluminescence and Structural Properties of ZnO Films Deposited on Si Substrates by Chemical Spray Deposition
Samira Sali, R. Tala-Ighil, S. Kermadi, M. Boumaour, M. Kechouane |
p111 |
|
Deposition of Titanium Nitride Thin Films onto Silicon by RF Reactive Magnetron Sputtering
Nadia Saoula, K. Henda, R. Kesri |
p117 |
|
Investigation of Deep Interface Traps in Very-Thin Oxide/Si Structures Prepared at Low Temperatures Using Chemical Solutions
Jaroslav Rusnák, Michal Ružinský, Kentaro Imamura, Taketoshi Matsumoto, Miloslav Štefečka, Masao Takahashi, Hikaru Kobayashi, Emil Pinčík |
p123 |
|
Correlation between Physicochemical and Electrical Properties of Hydrogenated Amorphous Silicon Doped with Boron: Effect of Thermal Annealing
H.Y. Seba, R. Cherfi, Farida Hamadache, M. Aoucher |
p129 |
