| ISBN-13: | 978-0-87849-156-8 |
|---|---|
| Year: | 2010 |
| Title: | Reaction Diffusion and Solid State Chemical Kinetics |
| Authors/Editors: | V.I. Dybkov |
| Published in: |
Materials Science Foundations (monograph series), Volumes 67 - 68
|
| Category: | |
| Pages: | 334 |
| Edition: | softcover |
| Description: | This monograph deals with a physico-chemical approach to the problem of the solid-state growth of chemical compound layers and reaction-diffusion in binary heterogeneous systems formed by two solids; as well as a solid with a liquid or a gas. It is explained why the number of compound layers growing at the interface between the original phases is usually much lower than the number of chemical compounds in the phase diagram of a given binary system. For example, of the eight intermetallic compounds which exist in the aluminium-zirconium binary system, only ZrAl3 was found to grow as a separate layer at the Al–Zr interface under isothermal conditions. The physico-chemical approach predicts that, in most cases, the number of compound layers should not exceed two; with the main factor, resulting in the appearance of additional layers, being crack formation due to thermal expansion and volume effects. The book is addressed to research workers, engineers, post-graduates and students (physical, solid-state and inorganic chemists, metal and solid-state physicists, materials and corrosion scientists, metallurgists, etc.) who are involved in the study of solid-state processes and their practical applications. The latter include the solid-state synthesis of inorganic substances, protective coatings, corrosion, all-in-one joining of dissimilar metals, welding, soldering, brazing and thin-film electronics technology. It will also be of value to theoreticians, experimentalists and technologists. |
| TOC: | Table of Contents |
| Prices: | USD: 166.00 / EUR: 129.00 |
