Etching of Silicon Dioxide with Gas Phase HF and Water: Initiation, Bulk Etching, and Termination.
Gerardo Montaño-Miranda, Anthony Muscat |
p3 |
|
Evaluation of the Plasmaless Gaseous Etching Process
Yoshiya Hagimoto, Hajime Ugajin, Daisuke Miyakoshi, Hayato Iwamoto, Yusuke Muraki, Takehiko Orii |
p7 |
|
Single Wafer Hydrophobic Surface Preparation on 300mm by HF Vapor
Thierry Salvetat, Olivier Pollet, Pascal Besson, Névine Rochat |
p11 |
|
Insights into HF-Last Processes and Particle Performance in a Single Wafer Spin Cleaning Tool
Gim Chen, Ismail Kashkoush |
p15 |
|
Implementing an In Situ Surface Preparation Prior to Ni Deposition for Ni Salicide Processes
Kyuh Wan Chang, Scott Bolton, Marc Rossow, Rich Gregory, Jack Jiang, Dharmesh Jawarani, Stefan Zollner, Dean Denning, Jon Cheek |
p19 |
|
Electrical Impact of Various Arsenic-Residues Cleanings
Y.S. Tan, S.P. Chiew, Z. Yang, Zainab Ismail, Felicia Goh, Christopher Lim, Vincent Sih, Ee Ping Yu, Goh Boon Cheng |
p23 |
|
Elimination of Watermark on Extremely High-Doped Poly-Silicon Surfaces Using HF-Vapor Cleaning
Kang Heon Lee, John Ghekiere, Joon Bum Shim, Eric J. Bergman, Gyu Hyun Kim, Bai Kil Choi, Kee Joon Oh, Geun Min Choi |
p27 |
|
Passivation Studies of Germanium Surfaces
Jung Yup Kim, Jim McVittie, Krishna Saraswat, Yoshio Nishi |
p33 |
|
Germanium Surface Passivation Using Ozone Gaseous Phase
Virginie Loup, Pascal Besson, Olivier Pollet, Eugénie Martinez, Emmanuelle Richard, Sandrine Lhostis |
p37 |
|
Surface States and Recombination Loss on Wet-Chemically Passivated Si Studied by Surface Photovoltage (SPV) and Photoluminescence (PL)
H. Angermann, J. Rappich |
p41 |
