Ultra Clean Processing of Semiconductor Surfaces VIII (Table of Contents)

Surface Microroughness of Silicon in Wet Process and its Minimization Hitoshi Morinaga, Kenji Shimaoka, Tadahiro Ohmi	p45
Oxidation of Si Surface Utilizing SCCO₂ K. Saito, T. Kitajima, M. Kohno, I. Mizobata, T. Iwata, S. Hirae	p49
Single-Wafer Wet Chemical Oxide Formation for Pre-ALD High-k Deposition on 300 mm Wafer Kenichi Sano, Akira Izumi, Atsuro Eitoku, James Snow, L. Nyns, S. Kubicek, R. Singanamalla, O. Richard, Thierry Conard, Rita Vos, Paul W. Mertens	p53
Effect of SC-1 Treatment in Thermal Wall Oxide on Nanoscale STI Gap-Filling by O₃/TEOS CVD Seung Cheol Lee, Choon Kun Ryu, Sang Wook Park, Gyu An Jin, Sang Deok Kim, Ki Hong Yang, Sang Hyon Kwak, Su Hyun Lim, Young Jun Kim, Sun Mi Park, Chul Sik Jang, Sung Ki Park	p57
Etch Rate Profile Characterization of High-κ Materials Annamaria Votta, Enrico Bellandi, Rosella Piagge, Massimo Caniatti, Francesco Pipia, Mauro Alessandri	p63
Critical Thickness Threshold in HfO₂ Layers Pascal Besson, Virginie Loup, Thierry Salvetat, Névine Rochat, Sandrine Lhostis, Sylvie Favier, Karen Dabertrand, Vincent Cosnier	p67
Surface Preparation Challenge on Nitrided Gate Oxides Philippe Garnier, David Barge, Jerome Bienacel, Brice Tavel, Nicolas Cabuil, Didier Lévy, Kathy Barla	p71
Development of a New TaN Etchant for Metal Gate Mong Sup Lee, Sang Yong Kim, Ji Hoon Cha, Jeong Nam Han, Im Soo Park, Kun Tack Lee, Chang Ki Hong, Han Ku Cho, Joo Tae Moon	p75
Peracetic Acid as Active Species in Mixtures for Selective Etching of SiGe/Si Layer Systems – Aspects of Chemistry and Analytics Mathias Guder, Bernd O. Kolbesen, Cécile Delattre, C. Fischer, H. Schier, Gerald Wagner	p79
A Wet Etching Technique to Reveal Threading Dislocations in Thin Germanium Layers Laurent Souriau, V. Terzieva, Marc Meuris, Matty Caymax	p83

Papers of Title

Ultra Clean Processing of Semiconductor Surfaces VIII

Table of Contents (88 papers, 10 per page listed)