| ISBN / ISBN-13: | 3-908451-45-0 / 978-3-908451-45-7 |
|---|---|
| Year: | 2007 |
| Title: | Diffusion in Advanced Materials and Processing [online] |
| Authors/Editors: | Y.H. Sohn, C. Campbell, D. Lewis and A. Lupulescu |
| Published in: | Defect and Diffusion Forum, Volumes 266 |
| Category: | Selected, peer reviewed papers from the Symposium TMS 136th Annual Meeting and Exhibition (Orlando, FL, February 25 – March 1, 2007) |
| Pages: | 222 |
| Edition: | softcover |
| Description: | The continued development of advanced materials and processes requires an intimate understanding of diffusion mechanisms, and having the ability to model the diffusion-controlled phenomena which occur within materials during processing. This special volume focuses on the identification and modeling of various diffusion mechanisms and phenomena occurring in the advanced materials used in structural, electronic and other applications, as well as those taking place during processes such as deposition, solidification and heat-treatment. The fundamental aspects discussed include: diffusion in nanomaterials, interfaces, dislocations, metallic glasses, amorphous materials, oxides, metals and metallic alloys. In addition, the applications of diffusion in nuclear power generation, solidification, steel processing and gas-turbine coating-materials are highlighted. Various educational and training tools are also presented. A pervasive theme throughout this handy work, is the use of mechanism-based models involving phenomenological, atomistic and first-principles approaches. |
| TOC: | Table of Contents |
| Prices: | USD: 136.00 / EUR: 99.00 |