Smart-Cut Process for Ultrathin SOI Wafers Manufacturing
Christophe Maleville |
p1 |
|
Investigation of Crystal Defects in Epitaxial Layers on Nitrogen-Doped Substrates and a Method for their Suppression
Katsuhiko Nakai, Koichi Kitahara, Yasumitsu Ohta, Atsushi Ikari, Masahiro Tanaka |
p11 |
|
Defect Formation in Heavily As-Doped Cz Si
S. Rouvimov, R. Kuytt, J. Kearns, V. Todt, B. Orschel, H. Siriwardane, A. Buczkowski, I. Shul'pina, George A. Rozgonyi |
p17 |
|
Recrystallization of Silicon on Insulator Layers Implanted with High Doses of Hydrogen Ions
I.E. Tyschenko, A.B. Talochkin, Anton K. Gutakovskii, V.P. Popov |
p23 |
|
Laser Crystallization of Thin a-Si Films on Plastic Substrates Using Excimer Laser Treatments
M.D. Efremov, V.A. Volodin, Liudmila I. Fedina, Anton K. Gutakovskii, D.V. Marin, S.A. Kochubei, A.A. Popov, Yu. A. Minakov, V.N. Ulasyuk |
p29 |
|
Predicting Material Parameters for Intrinsic Point Defect Diffusion in Silicon Crystal Growth
Michael Griebel, Lukas Jager, Axel Voigt |
p35 |
|
Dislocation Locking in Silicon by Oxygen and Oxygen Transport at Low Temperatures
Semih Senkader, A. Giannattasio, Robert J. Falster, Peter R. Wilshaw |
p43 |
|
Effect of Electron Irradiation on Thermal Donors in Oxygen-Doped High-Resistivity FZ Si
K. Takakura, H. Ohyama, T. Yoshida, Hidekazu Murakawa, J.M. Rafí, Reinhart Job, Alexander G. Ulyashin, Eddy Simoen, C. Claeys |
p53 |
|
Investigations of the Effect of High Pressure on the Annealing Behavior of Oxygen Related Defects in Silicon
Charalamos A. Londos, M.S. Potsidi, Andrzej Misiuk, Jadwiga Bak-Misiuk, Artem Shalimov, Valentin V. Emtsev |
p59 |
|
Simulation of Oxygen Contaminated Silicon Grain Boundaries in Cluster Approximation
Alex L. Pushkarchuk, A.K. Fedotov, S.A. Kuten |
p65 |
