Single Wafer Immersion Process Incorporating a Novel Megasonics Configuration with an Advanced IPA Vapor Condensation Dry
J.J. Rosato, E.G. Baiya, J.A. Imonigie, M.R. Yalamanchili, E. Hansen |
p45 |
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Metallic Contamination Removal Evaluation for Single Wafer Processing
Pieter Boelen, Steven Verhaverbeke, Philippe Garnier, Didier Levy, Hitoshi Morinaga |
p49 |
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Procedure to Evaluate Particle-Substrate Interaction during Immersion in Liquid
Wim Fyen, J. Vansteenbergen, Kai Dong Xu, Rita Vos, Paul W. Mertens, Marc M. Heyns |
p53 |
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Surfactant Selection for AM Clean in a Single Wafer Oasis Wet System
Jennifer Baker, Christopher Beaudry, Hitoshi Morinaga, Steven Verhaverbeke |
p57 |
|
Investigating Post CMP Cleaning Processes for STI Ceria Slurries
Robert Small, Pascal Berar, Brandon Scott |
p63 |
|
Long-Term Effect of Transportation on Particle Concentrations in Various Process Chemicals
S.I. Misat, G. De Vos, G. Huysmans |
p69 |
|
A New Industrial Etching & Drying Process for MEMS to Prevent Collapse of Microstructures
O. Raccurt, F. Arnaud d'Avitaya, E. Charlaix, T. Vareine, F. Tardif |
p73 |
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In Situ SymflowTM Etching in an STG® Dryer
Kurt K. Christenson, Nam Pyo Lee, Thomas J. Wagener, Steven L. Nelson |
p77 |
|
High Uniformity Wet Processing for Qxide Thinning and Polymer Cleaning Applications
Gerald Wagner, Kei Kinoshita, Reinhard Sellmer, Stefan Fichtl |
p81 |
|
Wet Oxide Etching of Dual Gate Oxide for 0.13μm Technologies and Beyond: Interaction with Photoresist and Equipment
Simon Y.M. Chooi, Sang-Yee Loong, Christopher Lim, Zainab Ismail, Tjin-Tjin Tjoa |
p85 |
