Improved Phosphoric Acid Mixtures for Nitride Strip
Rita Vos, Marcel Lux, Thierry Conard, H. De Witte, Paul W. Mertens, Marc M. Heyns, Z. Hatcher |
p43 |
|
Silicon Wafer Cleaning Processes Monitoring by the Surface Charge Profiler Method
Adrien Danel, Pascal Besson, T. Lardin, F. Tardif |
p47 |
|
New Aqueous Clean for Aluminum Interconnects: Part II. Applications
R. Ravikumar, D.L. Rath, D.J. Delehanty, R.G. Filippi, E.W. Kiewra, G. Stojakovic, K.J. McCullough, D.D. Miura, J. Gambino, F. Schnabel, B.N. Rhoads |
p51 |
|
Synchronous Schlieren Image Analysis of Megasonic Single Wafer Cleaning
Takashi Azuma, Akihiro Tomozawa, Hideo Kinoshita, Shin-ichiro Umemura |
p55 |
|
Dry Cleaning of Organic Contamination on Silicon Wafers Using Rapid Optical Surface Treatment
Adrien Danel, Névine Rochat, M. Olivier, A. Roche, F. Tardif |
p59 |
|
Materials Compatibility and Organic Build-Up during Ozone-Based Cleaning of Semiconductor Devices
F. De Smedt, Stefan De Gendt, Marc M. Heyns, Chris Vinckier |
p63 |
|
Surface Characterization after Different Wet Chemical Cleans
Martine Claes, Erika Röhr, Thierry Conard, F. De Smedt, Stefan De Gendt, W. Storm, T. Bauer, Paul W. Mertens, Marc M. Heyns |
p67 |
|
A Hydrogenated Water Application to Semiconductor Manufacturing
Ikunori Yokoi, Geun Min Choi, Yoshio Yamazaki, Tadahiro Ohmi |
p71 |
|
Investigation of Trace Metals Analyses of Dry Residue on Silicon Wafer Surfaces by TXRF and ICP-MS
Jiang Bo Wang, M. Balazs, Piero Pianetta, K. Baur, S. Brennan |
p75 |
|
Electrochemical Study for the Characterization of Wet Silicon Oxide Surfaces
V. Bertagna, R. Erre, F. Rouelle, M. Chemla, Sébastien Petitdidier, Didier Lévy |
p81 |
