Post Dry-Etch Cleaning Issues of an Organic Low-K Dielectric
F. Lanckmans, Mikhail R. Baklanov, C. Alaerts, Serge Vanhaelemeersch, Karen Maex |
p89 |
|
Vapor Phase Decomposition - Droplet Collection: Can we Improve the Collection Efficiency for Copper Contamination?
Stefan De Gendt, A. Huber, Bart Onsia, Sophia Arnauts, Karine Kenis, D. Martin Knotter, Paul W. Mertens, Marc M. Heyns |
p93 |
|
Characterization of the Post Dry Etch Cleaning of the Silicon Surface Prior to Silicon Epitaxial Growth
Y.B. Kim, Matty Caymax, H. Bender, Serge Vanhaelemeersch |
p97 |
|
Silicon Contamination Prevention in HF Mixtures
V. Bertagna, F. Rouelle, R. Erre, M. Chemla |
p101 |
|
Applications of Tetramethylammoninium Hydroxide (TMAH) as a Post Tungsten CMP Cleaning Mixture
M. Jolley |
p105 |
|
Fe and Cu Removal Efficiency in HF-DIW/O3 Cleaning Sequence
Francesco Pipia, Enrico Bellandi, Barbara Crivelli, Mauro Alessandri |
p109 |
|
Post Polysilicon Etch (Incorporating DUV Resist an BARC) Polymer Cleaning
Simon Y.M. Chooi, Ping-Yu Ee, B.-M. Seah, Mei Sheng Zhou |
p113 |
|
Determination of Moisture / Water in Semiconductor Processing Liquids On-Line with the SemiChem Process Analyzer
J.H. Evans-Freeman, G. Frank, P.M. Robertson |
p117 |
|
Evaluation of Cleaning Recipes Based on Ozonated Water for Pre-Gate Oxide Cleaning
Joong S. Jeon, Bob Ogle, M. Baeyens, Paul W. Mertens |
p119 |
|
Characterization of Emitter Interface Oxide Growth in a Vertical LPCVD Polysilicon Deposition Reactor
M. Ramin, C. Hechtl, A. Haeusler |
p123 |
