Influence of the Dissolved Gas in Cleaning Solution on Silicon Wafer Cleaning Efficiency
H. Kanetaka, Toshihiko Kujime, H. Yazaki, T. Kezuka, Tadahiro Ohmi |
p43 |
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Optimization of Deionized Water Consumption in Wafer Wet Processing
Ismail Kashkoush, R. Novak |
p49 |
|
Chemistry of the Silicon Oxide Surface: Adsorption from SC1 Solutions
L. Hall, J. Sees, Trace Hurd, B. Schmidt, L. Bellay, Lee M. Loewenstein, Paul W. Mertens |
p53 |
|
Production of High Concentrations of Bubble-Free Dissolved Ozone in Water
C. Gottschalk, U. Beuscher, S. Hardwick, Masakazu Kobayashi, J. Schweckendiek, M. Wikol |
p59 |
|
Si-Purifier: A Point of Use Purifier for Noble Metals in HF Baths
Alessio Beverina, F. Tardif |
p63 |
|
Potassium Adhesion to Various CVD Oxide and the Surface Cleaning with Hot UPW
T. Jizaimaru, H. Kanetaka, S. Omae, Tadahiro Ohmi |
p67 |
|
Production Performance of Single Tank Cleaning Processes for 0,25 μm Technology
K. Penner, K. Schupke, R. Pesce, J. Oshinowo, K. Wolke |
p71 |
|
Ozonated DI-Water for Clean Chemical Oxide Growth
I. Cornelissen, Marc Meuris, K. Wolke, M. Wikol, Lee M. Loewenstein, G. Doumen, Marc M. Heyns |
p77 |
|
Ultra-Thin Oxide Growth on Silicon Using Ozonated Solutions
F. De Smedt, Chris Vinckier, I. Cornelissen, Stefan De Gendt, Marc Meuris, G. Gilis, Marc M. Heyns |
p81 |
|
Gas-Phase Surface Processing Prior to 3.2 nm Gate Oxidation
J. Ruzyllo, Erika Röhr, M. Baeyens, Twan Bearda, Paul W. Mertens, Marc M. Heyns |
p85 |
