Trends and Challenges for Advanced Silicon Technologies
C. Claeys, L. Deferm |
p1 |
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Needs of Low Thermal Budget Processing in SiGe Technology
U. König, J. Hersener |
p17 |
|
History and Future of Semiconductor Wafer Bonding
U.M. Gösele, H. Stenzel, Manfred Reiche, T. Martini, H. Steinkirchner, Q.-Y. Tong |
p33 |
|
Building the Electron Superhighway: Back-End Processing and Simulation
F.H. Baumann |
p45 |
|
Role of Interstitial Atoms in Microscopic Processes on (113) and (001) Surfaces of Silicon
Jaroslaw Dąbrowski, Hans Joachim Müssig, G. Wolff |
p57 |
|
Silicon Materials and Metrology: Critical Concepts for Optimal IC Performance in the Gigabit Era
Howard R. Huff, R.K. Goodall |
p65 |
|
Expected Limits for Manufacturing Very Large Silicon Wafers
W. v. Ammon |
p97 |
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Diameter Effects on Grown-In Defects in CZ Crystal Growth
F. Uberti, K. Hagimoto |
p107 |
|
Silicon Carbide - A Promising Wide-Band-Gap Semiconductor for Electronic Devices
Gerhard Pensl, T. Troffer |
p115 |
|
Multicrystalline Silicon for Solar Cells
Hans Joachim Möller |
p127 |
