Selected Properties of Hydrogenated Amorphous Silicon and Silicon-Carbon Alloys
F. Alvarez, L.R. Tessler |
p3 |
|
On the Atomic Structure of Amorphous Semiconductors
L. Pusztai |
p25 |
|
Physics of Device Grade Amorphous Silicon
R.M. Mehra, P.C. Mathur, P.Craig Taylor |
p41 |
|
Very High Frequency Glow Discharge: Plasma- and Deposition Aspects
H. Keppner, U. Kroll, J. Meier, A. Shah |
p97 |
|
Hydrogen-Plasma Treated CVD Amorphous Silicon: Growth and Properties
I. Sakata, Mitsugu Yamanaka, Toshihiro Sekigawa, Yoshikazu Hayashi |
p127 |
|
Growth of Hydrogenated Amorphous Silicon in Electron Cyclotron Resonance Plasma
M. Zhang, Yukihiro Nakayama |
p135 |
|
Diagnostics of High-Rate a-Si:H Deposition in a Variable Frequency Plasma
M. Heintze |
p181 |
|
Ellipsometric Studies of a-Si:H Film Growth, Density and Microstructure
U.I. Schmidt, T. Haage, B. Schröder |
p195 |
|
Plasma Kinetics, Surface Phenomena and Growth Mechanism in Hydrogenated Amorphous Silicon: Transition from Amorphous to Micro- and Nano-Crystalline Si:H
D. Das |
p227 |
|
Luminescence of Porous and Amorphous Hydrogenated Silicon: Analogies and Differences
L. Pavesi |
p261 |
