| ISBN / ISBN-13: | 0-87849-606-8 / 978-0-87849-606-8 |
|---|---|
| Year: | 1991 |
| Title: | Synthesis and Properties of Boron Nitride [online] |
| Authors/Editors: | J. J. Pouch and S. A. Alterovitz |
| Published in: | Materials Science Forum, Volumes 54 - 55 |
| Category: | |
| Pages: | 426 |
| Edition: | |
| Description: | Boron nitride thin films can be deposited on different substrates using techniques such as plasma deposition, ion beam deposition and reactive sputter deposition. The films can be hard, wear resistant and transparent. The films can be useful for tribology, high temperature applications, chemical protection, passivation and insulation in microelectronics. Furthermore, devices and masks in X-ray lithography can be based on boron nitride. The chapters describe the methods for synthesizing boron nitride films, the resulting properties and the applications. |
| TOC: | Table of Contents |
| Prices: | USD: 242.00 / EUR: 175.00 |
