Formation and Optimization of Shallow Junctions by Ion Implantation and Rapid Thermal Annealing for CMOS Application
I Wei Wu |
p159 |
|
Fabrication of Nanometer Doping Structures by Secondary Implantation
H. Jorke |
p169 |
|
The Use of Ion Implantation for Lifetime Control in Silicon Devices
A. Mogro-Campero |
p177 |
|
Silicon Surface and Interface Damage Studies Using Ion Implantation
S. Ashok |
p187 |
|
Recoil Implantation for Shallow Junction Formation in Silicon
Harry L. Kwok |
p195 |
|
Defects in SIMOX Structures
R.C. Barklie |
p203 |
|
A Review of Deep Levels in Donor-Ion Implanted GaAs
D.W.E. Allsopp |
p211 |
|
Ion Implantation in GaAs
S.J. Pearton |
p247 |
|
Rapid Isothermal Annealing of Ion Implanted Gallium-Arsenide
Sukhdev Singh Gill |
p281 |
|
Defects and Doping Effects in CdTe and CulnS2 by Phosphorus Ion Implantation and Pulsed Electron Beam Annealing
H.Y. Ueng, H.L. Hwang |
p343 |
