The Expanding Role of Rapid Thermal Processing in CMOS Manufacturing
Jim Nakos, Joe Shepard |
p3 |
|
Evolution of Commercial RTP Modules
Bruce Peuse |
p21 |
|
Fast Diffusion in Germanium and Silicon Investigated by Lamp-Based Rapid Thermal Annealing
Nicolaas Stolwijk, Ludmila Lerner, Axel Giese, Wilfried Lerch |
p35 |
|
Rapid Thermal Processing and the Control of Oxygen Precipitation Behaviour in Silicon Wafers
Robert J. Falster, Vladimir V. Voronkov |
p45 |
|
High Temperature RTP Application in SOI Manufacturing
Christophe Maleville, Eric Neyret, Daniel Delprat, Ludovic Ecarnot |
p61 |
|
Cleaning of Silicon Surfaces for Nanotechnology
Oliver Senftleben, Hermann Baumgärtner, Ignaz Eisele |
p77 |
|
Heavy Water in Gate Stack Processing
Andrea E. Pap, Csaba Dücső, Katalin Kamarás, Gábor Battistig, István Bársony |
p119 |
|
Advanced Gate Dielectric Development for VLSI Technology
Yi Ma |
p133 |
|
A Growth Kinetics Model for the Radical Oxidation of Silicon
Olaf Storbeck, Wieland Pethe, Regina Hayn |
p147 |
|
Investigation of Ultra Thin Thermal Nitrided Gate Dielectrics in Comparison to Plasma Nitrided Gate Dielectrics for High-Performance Logic Application for 65nm
Martin Trentzsch, Christian Golz, Karsten Wieczorek, Rolf Stephan, Tilo Mantei, Boris Bayha, Susanne Ohsiek, Michael Raab, Zsolt Nényei, Wilfried Lerch, Jürgen Niess, Waltraud Dietl, Christoph Kirchner, Georg Roters |
p153 |
