High-K: Latest Developments and Perspectives
Anton J. Bauer, Martin Lemberger, Tobias Erlbacher, Wenke Weinreich |
p165 |
|
Production Worthy ALD in Batch Reactors
Alexander Gschwandtner |
p181 |
|
Ultra Shallow Depth Profiling with SIMS
H. Ulrich Ehrke |
p197 |
|
Implant Annealing – An Evolution from Soak over Spike to Millisecond Annealing
Silke Paul, Wilfried Lerch |
p207 |
|
A Light-Induced Annealing of Silicon Implanted Layers
Bo Lojek |
p229 |
|
Laser Annealing of Implanted Semiconductor Layers – One Bridge to Nano-Processing
Hans D. Geiler |
p237 |
|
An Overview of ms Annealing for Deep Sub-Micron Activation
Jeffrey C. Gelpey, Steve McCoy, Dave Camm, Wilfried Lerch |
p257 |
|
Extended Defects Evolution in Pre-Amorphised Silicon after Millisecond Flash Anneals
Fuccio Cristiano, El Mehdi Bazizi, Pier Francesco Fazzini, Simona Boninelli, Ray Duffy, Ardechir Pakfar, Silke Paul, Wilfried Lerch |
p269 |
|
Modeling and Simulation of Advanced Annealing Processes
Alberto Martinez-Limia, Peter Pichler, Christian Steen, Silke Paul, Wilfried Lerch |
p279 |
|
Vacancy Engineering – An Ultra-Low Thermal Budget Method for High-Concentration 'Diffusionless' Implantation Doping
Nicholas E.B. Cowern, Andrew J. Smith, Nicholas S. Bennett, Brian J. Sealy, Russell Gwilliam, Roger P. Webb, Benjamin Colombeau, Silke Paul, Wilfried Lerch, Ardechir Pakfar |
p295 |
